8D改善手法運用-以半導體黃光區為例

A Study of Applying 8D Procedures – Taking the Photolithography Area of Semiconductor as an example

盧銘勳1、邱吉民2
M. S. Lu1 and C. M. Chiu2

1逢甲大學 工業工程與系統管理學系
2華邦電子股份有限公司 黃光設備二課


摘要

動態存取記憶體( Dynamic Random Access Memory, DRAM)也就是我們所說的 DRAM,DRAM 產業的景氣循環上下起伏變 化之大,有鑑於此,減少缺陷及降低成本皆 為各大半導體廠之目的,換言之,便是在於 減少生產上各層面的損失,來達到以最小資 源發揮最大效益之成效。因此本研究將探討 在DRAM 廠遇到各式各樣的缺陷使工廠各 項指標數據如OEE%(Overall Equipment Effectiveness, 設備總和效率)降低時,如何 使用8D(8 Discipline)手法來解決問題,提升 相對數據,並減少損失與把資料彙整成為資 料庫,作為後續改善的範本。

關鍵字:動態存取記憶體、缺陷、8D 改善 手法。


ABSTRACT

DRAM firm always suffers from the unbalance of supply and demand. It Causes the product price is often lower than the cost. So, DRAM firms always search the production ways to keep increasing efficiency and reducing the cost. One solution of reducing cost is to decrease defects from production line, improve the tool efficiency, to increase the yield of the production and to promote the machine using time. Therefore, how to keep reducing defects becomes a very important case of the DRAM production. This research is to figure out the change of the defect in our factory, when defect decreases, and influences the product shipment. Then we using the 8D improve method to solve this problem in the PHOTO area at DRAM firm, we can find the problem, analysis the problem and eliminate the problem, not only decreased the defect but also increased the efficiency, we can also reach the data and record all data into book, and let it be the samples in firm, and people can use them if needed.

Keywords: DRAM; Defect; 8D discipline